Pronouns: he/him
Bias-pulsed atomic layer etching of 4H-silicon carbide producing subangstrom surface roughness
J. A. Michaels, N. Delegan, Y. Tsaturyan, J. R. Renzas, D. D. Awschalom, J. G. Eden, F. J. Heremans. Bias-pulsed atomic layer etching of 4H-silicon carbide producing subangstrom surface roughness. 2023. Journal of Vacuum Science & Technology A 41, 3, 032607. 10.1116/6.0002447