Takejiro was born in 1977 and grew up in Chiba, Japan, and moved to Yokohama to study analytical chemistry. After receiving his MS from Keio University in 2002, he joined Toray Industries, Inc. Since then, he has been working on the design and synthesis of new polymer materials for future electronic devices. He joined the Nealey Group as a visiting scientist in April 2013.
Dr. Inoue is working on approaches to replicate extremely fine patterns formed by directed self-assembly of block copolymers. Molecular transfer printing (MTP) is a strong candidate for future high-throughput and high-resolution patterning technique. This process involves transferring a “master” pattern—made by conventional technology, such as photolithography, e-beam, or EUV—from the original substrate to an unlimited number of other “daughter” substrates. Dr. Inoue is currently exploring roll-to-roll (R2R) processing using molecular transfer printing. He is collaborating with researchers at the University of Texas-Austin to develop light-activated cross-linking transfer agents.
Molecular Transfer Printing of Block Copolymer Patterns over Large Areas with Conformal Layers
T. Inoue, D.W. Janes, J. Ren, H.S. Suh, X. Chen, C.J. Ellison and P.F. Nealey. Molecular Transfer Printing of Block Copolymer Patterns over Large Areas with Conformal Layers. Advanced Materials Interfaces. 2015. Vol. 2.
Photochemical Reactions for Replicating and Aligning Block Copolymer Thin Film Patterns
Dustin W. Janes, Takejiro Inoue, Bradley D. McCoy, Ishita Madan, Paul F. Nealey, C. Grant Willson, Christopher J. Ellison. Photochemical Reactions for Replicating and Aligning Block Copolymer Thin Film Patterns. Journal of Photopolymer Science and Technology. 2014. Vol. 27, Pg. 435-440.