Takahiro did his undergraduate study in material engineering at Tokyo University of Science in Japan, where he studied polymer synthesis. After graduating, he worked at Mitsubishi Rayon Co., Ltd. and then joined Tokyo Ohka Kogyo Co., Ltd. (TOK). Since then, he has been working on the design and synthesis of new polymer and resist patterning for the next generation of resist materials. He joined Professor Nealey’s group at the University of Chicago in October 2014 as a visiting scientist.
Takahiro Dazai is working on investigating the characteristics of polymer brushes and effect on the phase separation of block copolymers for use in the next generation lithographic techniques. Takahiro is also studying the relationship between the chemistry of polymer brushes and defectivity of contact-hole shrink process for the case of the characterization of polymer brushes using cylinder forming PS-b-PMMA block copolymer. He is also involved with the Center for Material Nanoscale Materials at Argonne National Lab, where he is studying techniques for data collection and analysis on polymer nanostructures.
Zhou, Chun, et al. "Studying the effects of chemistry and geometry on DSA hole-shrink process in three-dimensions." Journal of Micro/Nanolithography, MEMS, and MOEMS 17.3 (2018): 031203.