Dr. Chen did his undergraduate study at Nanjing University of Technology in 2002 and got a PhD in polymer chemistry and physics in 2007 from Nanjing University, where, under the direction of Professor Gi Xue, he investigated the nanostructures of conjugated polymers. He became an associate professor at Nanjing University of Technology in 2010. Since September 2013, he has worked as a postdoc under Professor Nealey at the Pritzker School of Molecular Engineering at the University of Chicago.
Dr. Shuangjun Chen focused on the non-preferential bottom surface and top surface by using ultrathin polystyrene film for perpendicular nanopatterns of block copolymers, such as polystyrene-b-polymethyl methacrylate or polystyrene-b-poly-2-vinylpyridine. The more well-established BCP DSA process was developed around the principle of thermal annealing, which is the most reliable pathway to induce the self-assembly of block copolymers. Dr. Chen tried to understand the phase separation of bottom structures by turnover in the BCPs' perpendicular nanopatterns.