Nealey Group

Jeimoon Yun

Yun received his BS in chemical engineering in 1992 from Inha University in South Korea. He then moved to KAIST where he received his MS in chemistry in 1995. From 1995 until 2005, Dr. Yun was a materials engineer with the Korean Aerospace Industry company, making organic bulletproof armor for fighter jet pilot seats. He returned to KAIST in 1995 to work in the specialty polymer lab, obtaining his PhD there with Dr. Jin Baek Kim on nanopatterning and chemically amplified photoresists. He joined the materials science department at KAIST for a postdoctoral position where he worked on graphene oxide biomaterials applications using photolithography. Yun joined PME in the fall of 2012 and has a joint assignment at Argonne National Laboratory.

Dr. Yun is the representative from the Nealey Group for the multi-university research initiative (MURI), a project focusing on bringing together expertise from different groups to develop a nanoimprint lithography process. In close collaboration with the University of Minnesota, he is investigating various materials for their feasibility in implementation of nanoimprint lithography in a continuous roll-to-roll (R2R) process. In a different project, Yun is studying the wetting behavior of graphene oxide and whether it can be tuned through various process treatments. Finally, he is actively involved in several other projects in the Nealey group involving the synthesis and use of topcoat materials to direct block copolymer assembly.