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Nealey Group

Chi-Chun Liu

  • Research Staff Member at IBM

Dr. Liu has been a research staff member at IBM Research since June 2012. Previously he was a researcher at IBM Research, Almaden Research Laboratory (February 2011 - June 2012), a research assistant at University of Wisconsin-Madison (September 2005 - September 2010), and an etch process engineer at the Taiwan Semiconductor Manufacturing Company (April 2002 - August 2005). He is the co-inventor of the "LiNe" (Liu-Nealey) flow. It is one of the first and most widely used DSA processes in the industry.