PME Thesis Defense - Vepa Rozyyev

Atomically Engineered Surfaces Via Atomic Layer Deposition and Vapor-Phase Grafting: Water Treatment Applications

Atomic layer deposition (ALD) and vapor-phase grafting are surface engineering techniques that offer highly conformal and uniform coatings essential for the next generation water treatment technologies. The atomic-level control achieved by ALD over film thickness and composition, combined with the ability of vapor-phase grafting to tailor surface chemistry, provides a powerful toolkit for enhancing the efficacy of membrane filtration and adsorption processes. This work explores applying these techniques to enhance the performance of water treatment technologies. By developing uniform thin films and strategically functionalized surfaces, we achieve significant improvements in the functionality of membranes and adsorbents, leading to enhanced filtration efficiency and more effective removal of contaminants. Our research extends to the implementation of selective adsorption methods, enabling the targeted capture of hazardous ions through meticulously tailored surface

chemistries. The findings presented herein contribute to the advancement of water treatment technologies and underscore the significance of ALD and vapor-phase grafting as key surface engineering techniques with potential applications beyond water purification.

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